Low Temperature Annealing of Rh (111) Surfaces

F. Tsui; Joanne Wellman; J. J. Xu; Ctirad Uher; Roy Clarke

doi:10.1557/proc-440-317

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Low Temperature Annealing of Rh (111) Surfaces

F. Tsui Joanne Wellman J. J. Xu Ctirad Uher Roy Clarke

Year: 1996 Journal: MRS Proceedings Vol: 440 Publisher: Cambridge University Press

DOI: 10.1557/proc-440-317

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Keywords:

Materials science Annealing (glass) Scanning tunneling microscope Kinetics Flattening Epitaxy Surface diffusion Low-energy electron diffraction Chemical physics Activation energy Crystallography Electron diffraction Diffraction Condensed matter physics Nanotechnology Optics Composite material Physical chemistry Layer (electronics) Chemistry

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Advanced Chemical Physics Studies

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Magnetic properties of thin films

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Surface and Thin Film Phenomena

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Low Temperature Annealing of Rh (111) Surfaces

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