Chemical Vapor Deposition of Ferroelectric Thin Films

Christopher Foster

doi:10.1007/978-1-4615-6185-9_7

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Chemical Vapor Deposition of Ferroelectric Thin Films

Christopher Foster

Year: 1997 Pages: 167-197

DOI: 10.1007/978-1-4615-6185-9_7

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Keywords:

Dram Materials science Dielectric Dynamic random-access memory Capacitor Optoelectronics Integrated circuit Node (physics) Data retention Engineering physics Chemical vapor deposition Silicon nitride Electrical engineering Electronic engineering Nanotechnology Silicon Voltage Semiconductor memory Engineering

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Ferroelectric and Piezoelectric Materials

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Acoustic Wave Resonator Technologies

Physical Sciences → Engineering → Biomedical Engineering

Chemical Vapor Deposition of Ferroelectric Thin Films

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