Micro-mixer device with deep channels in silicon using modified RIE process: fabrication, packaging and characterization

Saakshi Dhanekar; Sudhir Chandra; R. Balasubramaniam

doi:10.1007/s00542-015-2579-3

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Micro-mixer device with deep channels in silicon using modified RIE process: fabrication, packaging and characterization

Saakshi Dhanekar Sudhir Chandra R. Balasubramaniam

Year: 2015 Journal: Microsystem Technologies Vol: 22 (3)Pages: 515-522 Publisher: Springer Science+Business Media

DOI: 10.1007/s00542-015-2579-3

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Keywords:

Materials science Anodic bonding Silicon Wafer Reactive-ion etching Fabrication Substrate (aquarium) Deep reactive-ion etching Optoelectronics Etching (microfabrication) Micromixer Surface roughness Electronic engineering Nanotechnology Microfluidics Layer (electronics) Composite material

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Microfluidic and Capillary Electrophoresis Applications

Physical Sciences → Engineering → Biomedical Engineering

Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Electrowetting and Microfluidic Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Micro-mixer device with deep channels in silicon using modified RIE process: fabrication, packaging and characterization

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