Enhancement of Ti-containing hydrogenated carbon (TiC:H) films by high-power plasma-sputtering

Jyh Gwo; Chun-Lin Chu; Ming-Jui Tsai; Shyong Lee

doi:10.1016/j.apsusc.2011.11.090

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Enhancement of Ti-containing hydrogenated carbon (TiC:H) films by high-power plasma-sputtering

Jyh Gwo Chun-Lin Chu Ming-Jui Tsai Shyong Lee

Year: 2011 Journal: Applied Surface Science Vol: 258 (8)Pages: 3433-3437 Publisher: Elsevier BV

DOI: 10.1016/j.apsusc.2011.11.090

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Keywords:

Materials science Nanoindenter Sputter deposition Sputtering Microstructure Thin film Raman spectroscopy Carbon film High-power impulse magnetron sputtering Titanium Scanning electron microscope Amorphous carbon Substrate (aquarium) Amorphous solid Tribometer Glow discharge X-ray photoelectron spectroscopy Composite material Metallurgy Chemical engineering Tribology Nanotechnology Nanoindentation Plasma Optics Crystallography Chemistry

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Enhancement of Ti-containing hydrogenated carbon (TiC:H) films by high-power plasma-sputtering

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