Intrinsic stress in DC sputtered niobium

P.A.A. Booi; Christine A. Livingston; S. P. Benz

doi:10.1109/77.257236

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Intrinsic stress in DC sputtered niobium

P.A.A. Booi Christine A. Livingston S. P. Benz

Year: 1993 Journal: IEEE Transactions on Applied Superconductivity Vol: 3 (2)Pages: 3029-3031 Publisher: IEEE Council on Superconductivity

DOI: 10.1109/77.257236

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Abstract

The intrinsic mechanical stress of DC-magnetron-sputtered Nb films is characterized as a function of sputtering parameters and target erosion. The zero-stress point shifts to lower cathode voltages as the target erodes. The zero-stress point is always characterized by the same cathode-current-Ar-pressure relationship.< >

Keywords:

Cathode Niobium Stress (linguistics) Materials science Zero (linguistics) Voltage Point (geometry) Sputter deposition Condensed matter physics Function (biology) Sputtering Physics Electrical engineering Thin film Metallurgy Nanotechnology Quantum mechanics Geometry Mathematics

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Plasma Diagnostics and Applications

Physical Sciences → Engineering → Electrical and Electronic Engineering

Intrinsic stress in DC sputtered niobium

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