Optofluidic Maskless Lithography System

Seok Chung; Wook Park; Hyun-Sung Park; Kyoungsik Yu; Namkyoo Park; Sunghoon Kwon

doi:10.1109/sensor.2007.4300446

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JOURNAL ARTICLE

Optofluidic Maskless Lithography System

Seok Chung Wook Park Hyun-Sung Park Kyoungsik Yu Namkyoo Park Sunghoon Kwon

Year: 2007 Journal: TRANSDUCERS 2007 - 2007 International Solid-State Sensors, Actuators and Microsystems Conference Vol: 121 Pages: 1569-1572

DOI: 10.1109/sensor.2007.4300446

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Abstract

We propose and demonstrate an optofluidic maskless lithography technique to fabricate various polymer microparticles and microwires in microfluidic channels. Combining maskless lithography and microfluidic systems, we demonstrate temporal and spatial control of polymeric micro structure generation in microfluidic channels.

Keywords:

Maskless lithography Microfluidics Lithography Nanotechnology Materials science Soft lithography Photolithography Computational lithography Next-generation lithography Optoelectronics Electron-beam lithography X-ray lithography Fabrication Resist

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Innovative Microfluidic and Catalytic Techniques Innovation

Physical Sciences → Engineering → Biomedical Engineering

Microfluidic and Capillary Electrophoresis Applications

Physical Sciences → Engineering → Biomedical Engineering

Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Optofluidic Maskless Lithography System

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