Maskless ion beam lithography system

Y. Lee; Richard Gough; Tsu-Jae King; Qing Ji; K. N. Leung; R. Andrew McGill; Vinh Van Ngo; Michael D. Williams; N. Zahir

doi:10.1016/s0167-9317(99)00042-8

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Maskless ion beam lithography system

Y. Lee Richard Gough Tsu-Jae King Qing Ji K. N. Leung R. Andrew McGill Vinh Van Ngo Michael D. Williams N. Zahir

Year: 1999 Journal: Microelectronic Engineering Vol: 46 (1-4)Pages: 469-472 Publisher: Elsevier BV

DOI: 10.1016/s0167-9317(99)00042-8

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Keywords:

Ion beam lithography Lithography Column (typography) Maskless lithography Ion beam Beam (structure) Materials science Focused ion beam Ion Optics Optoelectronics Nanotechnology Electron-beam lithography Chemistry Physics Resist Computer science Telecommunications Layer (electronics)

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Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Electron and X-Ray Spectroscopy Techniques

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Maskless ion beam lithography system

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