Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering — plasma immersion ion implantation and deposition (HPPMS–PIII&amp;D)

Zhongzhen Wu; Xiubo Tian; Yongqiang Wei; Chunzhi Gong; Shiqin Yang; Feng Pan; Paul K. Chu

doi:10.1016/j.surfcoat.2013.10.007

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Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering — plasma immersion ion implantation and deposition (HPPMS–PIII&D)

Zhongzhen Wu Xiubo Tian Yongqiang Wei Chunzhi Gong Shiqin Yang Feng Pan Paul K. Chu

Year: 2013 Journal: Surface and Coatings Technology Vol: 236 Pages: 320-325 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2013.10.007

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Keywords:

Materials science High-power impulse magnetron sputtering Plasma-immersion ion implantation Sputter deposition Fabrication Sputtering Transmission electron microscopy Layer (electronics) Nanotechnology Ion implantation Optoelectronics Thin film Composite material Ion

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering — plasma immersion ion implantation and deposition (HPPMS–PIII&D)

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