JOURNAL ARTICLE

Optical constants of amorphous hydrogenated germanium thin films

Stuart WhiteDavid R. McKenzie

Year: 1988 Journal:   Applied Optics Vol: 27 (16)Pages: 3344-3344   Publisher: Optica Publishing Group

Abstract

The optical constants (n + ik) and dielectric function (in(1) + iin(2)) of thin films of amorphous hydrogenated germanium prepared by glow discharge decomposition of germane have been determined by photometry. The results were shown to be essentially unaffected by the presence of an oxide overlayer in contrast to recent results obtained using ellipsometry. The effect of deposition temperature was investigated. The effect of increasing substrate temperature is to increase the height of the peak in in(2) and the energy at which the peak occurs. The energy gap E(0) is not significantly affected by substrate temperature and has the value of 1.06 eV.

Keywords:
Germane Overlayer Germanium Materials science Amorphous solid Thin film Germanium oxide Ellipsometry Analytical Chemistry (journal) Dielectric Optics Substrate (aquarium) Silicon Optoelectronics Chemistry Crystallography Nanotechnology Physical chemistry

Metrics

16
Cited By
0.44
FWCI (Field Weighted Citation Impact)
30
Refs
0.71
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Surface Roughness and Optical Measurements
Physical Sciences →  Engineering →  Computational Mechanics
Phase-change materials and chalcogenides
Physical Sciences →  Materials Science →  Materials Chemistry
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