Thermal stability of carbon nitride thin films

Niklas Hellgren; Nian Lin; Esteban Broitman; V. Serin; S.E. Grillo; Ray D. Twesten; I. Petrov; C. Colliex; Lars Hultman; J.‐E. Sundgren

doi:10.1557/jmr.2001.0440

JOURNAL ARTICLE

Thermal stability of carbon nitride thin films

Niklas Hellgren Nian Lin Esteban Broitman V. Serin S.E. Grillo Ray D. Twesten I. Petrov C. Colliex Lars Hultman J.‐E. Sundgren

Year: 2001 Journal: Journal of materials research/Pratt's guide to venture capital sources Vol: 16 (11)Pages: 3188-3201 Publisher: Springer Nature

DOI: 10.1557/jmr.2001.0440

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Keywords:

Annealing (glass) Materials science X-ray photoelectron spectroscopy Raman spectroscopy Thermal stability Nitride Amorphous solid Carbon nitride Analytical Chemistry (journal) Carbon film Amorphous carbon Microstructure Sputter deposition Thin film Sputtering Chemical engineering Crystallography Composite material Nanotechnology Chemistry Optics Layer (electronics) Organic chemistry

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Thermal stability of carbon nitride thin films

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