JOURNAL ARTICLE

Thermal stability of nitride thin films

Lars Hultman

Year: 2000 Journal:   Vacuum Vol: 57 (1)Pages: 1-30   Publisher: Elsevier BV
Keywords:
Materials science Titanium nitride Nitride Tin Thermal stability Recrystallization (geology) Metastability Thin film Physical vapor deposition Composite material Titanium Metallurgy Nanotechnology Chemical engineering Layer (electronics) Chemistry

Metrics

614
Cited By
19.24
FWCI (Field Weighted Citation Impact)
117
Refs
1.00
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Diamond and Carbon-based Materials Research
Physical Sciences →  Materials Science →  Materials Chemistry
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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