Thermal stability of nitride thin films

Lars Hultman

doi:10.1016/s0042-207x(00)00143-3

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Thermal stability of nitride thin films

Lars Hultman

Year: 2000 Journal: Vacuum Vol: 57 (1)Pages: 1-30 Publisher: Elsevier BV

DOI: 10.1016/s0042-207x(00)00143-3

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Keywords:

Materials science Titanium nitride Nitride Tin Thermal stability Recrystallization (geology) Metastability Thin film Physical vapor deposition Composite material Titanium Metallurgy Nanotechnology Chemical engineering Layer (electronics) Chemistry

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Thermal stability of nitride thin films

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