MOCVD of SrTa<sub>2</sub>O<sub>6</sub>Thin Films for High-k Applications

S. Regnery; Reji Thomas; H. Haselier; P. Ehrhart; Rainer Waser; P. Lehnen; S. Miedl; Markus Schumacher

doi:10.1557/proc-811-d9.7

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MOCVD of SrTa₂O₆Thin Films for High-k Applications

S. Regnery Reji Thomas H. Haselier P. Ehrhart Rainer Waser P. Lehnen S. Miedl Markus Schumacher

Year: 2004 Journal: MRS Proceedings Vol: 811 Publisher: Cambridge University Press

DOI: 10.1557/proc-811-d9.7

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Keywords:

Materials science Amorphous solid Metalorganic vapour phase epitaxy Analytical Chemistry (journal) Chemical vapor deposition Thin film Annealing (glass) Stoichiometry Permittivity Atmospheric temperature range Dielectric Epitaxy Optoelectronics Nanotechnology Crystallography Layer (electronics) Composite material Physical chemistry

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Ferroelectric and Piezoelectric Materials

Physical Sciences → Materials Science → Materials Chemistry

MOCVD of SrTa₂O₆Thin Films for High-k Applications

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