JOURNAL ARTICLE
High-Bandgap a-SI:H Deposited by Concentric-Electrode rf Glow Discharge
J. P. CondeFernando LauV. ChuK. K. ChanJ. M. BlumM. Arienzo
Year: 1992 Journal: MRS Proceedings Vol: 258 Publisher: Cambridge University Press
Keywords:
Materials science Plasma-enhanced chemical vapor deposition Silane Amorphous silicon Glow discharge Electrode Analytical Chemistry (journal) Band gap Photoconductivity Hydrogen Plasma Silicon Optoelectronics Crystalline silicon Composite material Chemistry
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Topics
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences → Materials Science → Materials Chemistry
Silicon and Solar Cell Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
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