Partially ionized beam deposition of oriented films

A. S. Yapsir; Lü You; Toh‐Ming Lu; M. Madden

doi:10.1557/jmr.1989.0343

ScienceGate Book Chapters

JOURNAL ARTICLE

Partially ionized beam deposition of oriented films

A. S. Yapsir Lü You Toh‐Ming Lu M. Madden

Year: 1989 Journal: Journal of materials research/Pratt's guide to venture capital sources Vol: 4 (2)Pages: 343-349 Publisher: Springer Nature

DOI: 10.1557/jmr.1989.0343

Get Full-Text PDF Get Analytical Report

Keywords:

Materials science Microstructure Substrate (aquarium) Deposition (geology) Ion Biasing Ion beam Analytical Chemistry (journal) Ionization Ion beam-assisted deposition Atom (system on chip) Ion plating Grain size Thin film Composite material Voltage Nanotechnology Electrical engineering

Metrics

Cited By

10.94

FWCI (Field Weighted Citation Impact)

Refs

0.99

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Topics

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Partially ionized beam deposition of oriented films

Metrics

Topics

Related Documents

Partially Ionized Beam Deposition of Thin Films

Reactive partially ionized beam deposition of AlN thin films

Reactive partially ionized beam deposition of BaTiO3 thin films

Partially ionized beam deposition of Ag films on insulating substrates

Cu Films on Si(100) by Partially Ionized Beam Deposition