Influence of oxygen partial pressure on magnetron sputtered Sr0.8Nd0.3Bi2.5Ta2O9+x ferroelectric thin films

Yibin Li; Sam Zhang; Thirumany Sritharan; Yang Liu; T. P. Chen

doi:10.1016/j.jallcom.2007.03.095

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Influence of oxygen partial pressure on magnetron sputtered Sr0.8Nd0.3Bi2.5Ta2O9+x ferroelectric thin films

Yibin Li Sam Zhang Thirumany Sritharan Yang Liu T. P. Chen

Year: 2007 Journal: Journal of Alloys and Compounds Vol: 457 (1-2)Pages: 549-554 Publisher: Elsevier BV

DOI: 10.1016/j.jallcom.2007.03.095

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Keywords:

Partial pressure Thin film Sputter deposition X-ray photoelectron spectroscopy Materials science Sputtering Microstructure Oxygen Analytical Chemistry (journal) Scanning electron microscope Perovskite (structure) Bismuth Ferroelectricity Chemistry Chemical engineering Crystallography Dielectric Metallurgy Nanotechnology Composite material Optoelectronics

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Ferroelectric and Piezoelectric Materials

Physical Sciences → Materials Science → Materials Chemistry

Acoustic Wave Resonator Technologies

Physical Sciences → Engineering → Biomedical Engineering

Microwave Dielectric Ceramics Synthesis

Physical Sciences → Engineering → Electrical and Electronic Engineering

Influence of oxygen partial pressure on magnetron sputtered Sr0.8Nd0.3Bi2.5Ta2O9+x ferroelectric thin films

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