JOURNAL ARTICLE
Nonselective etching of GaN/AlGaN heterostructures by Cl2/Ar/BCl3 inductively coupled plasmas
Keywords:
Inductively coupled plasma Etching (microfabrication) Optoelectronics Materials science Heterojunction Plasma Nanotechnology Physics Layer (electronics)
Metrics
8
Cited By
0.23
FWCI (Field Weighted Citation Impact)
13
Refs
0.57
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
GaN-based semiconductor devices and materials
Physical Sciences → Physics and Astronomy → Condensed Matter Physics
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Metal and Thin Film Mechanics
Physical Sciences → Engineering → Mechanics of Materials
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