JOURNAL ARTICLE
Precursors for the Chemical Vator Deposition of Titanium Nitride and Titanium Aluminum Nitride Films
Charles H. WinterPeggy J. McKarnsJoseph T. Scheper
Year: 1997 Journal: MRS Proceedings Vol: 495 Publisher: Cambridge University Press
Keywords:
Materials science Titanium nitride Nitride Titanium Aluminium Metallurgy Deposition (geology) Nanotechnology Layer (electronics)
Metrics
10
Cited By
1.38
FWCI (Field Weighted Citation Impact)
45
Refs
0.81
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Metal and Thin Film Mechanics
Physical Sciences → Engineering → Mechanics of Materials
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
GaN-based semiconductor devices and materials
Physical Sciences → Physics and Astronomy → Condensed Matter Physics
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