Precursors for the Chemical Vapor Deposition of Titanium Disulfide and Titanium Nitride Films

Charles H. Winter

doi:10.1007/978-1-4899-0145-3_5

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Precursors for the Chemical Vapor Deposition of Titanium Disulfide and Titanium Nitride Films

Charles H. Winter

Year: 1997 Pages: 115-129

DOI: 10.1007/978-1-4899-0145-3_5

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Keywords:

Chemical vapor deposition Materials science Thin film Titanium Nanotechnology Nitride Titanium nitride Deposition (geology) Carbide Chemical engineering Metallurgy

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Tribology and Wear Analysis

Physical Sciences → Engineering → Mechanics of Materials

Advanced Materials and Semiconductor Technologies

Physical Sciences → Materials Science → Materials Chemistry

Precursors for the Chemical Vapor Deposition of Titanium Disulfide and Titanium Nitride Films

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