Microstructural Observations of LPCVD Double Layer Polysilicon Thin Film Tensile Specimens

M. Legros; Mahesh Kumar; Bharat Jayaraman; Kevin J. Hemker; W. N. Sharpe

doi:10.1557/proc-472-275

ScienceGate Book Chapters

JOURNAL ARTICLE

Microstructural Observations of LPCVD Double Layer Polysilicon Thin Film Tensile Specimens

M. Legros Mahesh Kumar Bharat Jayaraman Kevin J. Hemker W. N. Sharpe

Year: 1997 Journal: MRS Proceedings Vol: 472 Publisher: Cambridge University Press

DOI: 10.1557/proc-472-275

Get Full-Text PDF Get Analytical Report

Keywords:

Materials science Polycrystalline silicon Thin film Ultimate tensile strength Crystallite Microelectronics Composite material Microstructure Silicon Layer (electronics) Chemical vapor deposition Optoelectronics Nanotechnology Thin-film transistor Metallurgy

Metrics

Cited By

0.91

FWCI (Field Weighted Citation Impact)

Refs

0.78

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Topics

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Microstructural Observations of LPCVD Double Layer Polysilicon Thin Film Tensile Specimens

Metrics

Topics

Related Documents

Optical Measurement of Strain on Thin-film Polysilicon Tensile Specimens

Subthreshold behavior of thin-film LPCVD PolySilicon MOSFET's

Microstructural and optical properties of LPCVD polysilicon films

Stress and Microstructural Evolution of Lpcvd Polysilicon Thin Films During High Temperature Annealing

Thin Film Effects of Double-Gate Polysilicon MOSFET