Formation of tantalum oxide by chemical vapor deposition

Takehiko Takahashi; Hideaki Itoh

doi:10.1016/0022-5088(74)90064-2

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Formation of tantalum oxide by chemical vapor deposition

Takehiko Takahashi Hideaki Itoh

Year: 1974 Journal: Journal of the Less Common Metals Vol: 38 (2-3)Pages: 211-219 Publisher: Elsevier BV

DOI: 10.1016/0022-5088(74)90064-2

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Keywords:

Tantalum Chemical vapor deposition Whiskers Oxide Atmospheric temperature range Materials science Wafer Deposition (geology) Analytical Chemistry (journal) Chemical engineering Chemistry Metallurgy Nanotechnology Composite material Organic chemistry Thermodynamics

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Formation of tantalum oxide by chemical vapor deposition

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