JOURNAL ARTICLE

Chemical vapor deposition of tantalum nitride films

Takehiko TakahashiHideaki ItohShiroh Ozeki

Year: 1977 Journal:   Journal of the Less Common Metals Vol: 52 (1)Pages: 29-36   Publisher: Elsevier BV
Keywords:
Tantalum nitride Tantalum Materials science Analytical Chemistry (journal) Chemical vapor deposition Nitride Crystallite Substrate (aquarium) Nitrogen Volumetric flow rate X-ray photoelectron spectroscopy Metallurgy Chemistry Chemical engineering Composite material Layer (electronics) Nanotechnology

Metrics

11
Cited By
0.67
FWCI (Field Weighted Citation Impact)
11
Refs
0.72
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advanced ceramic materials synthesis
Physical Sciences →  Materials Science →  Ceramics and Composites

Related Documents

JOURNAL ARTICLE

Chemical vapor deposition of vanadium, niobium, and tantalum nitride thin films

Renaud M. FixRoy G. GordonDavid M. Hoffman

Journal:   Chemistry of Materials Year: 1993 Vol: 5 (5)Pages: 614-619
JOURNAL ARTICLE

Chemical vapor deposition of aluminum nitride thin films

Roy G. GordonUmar RiazDavid M. Hoffman

Journal:   Journal of materials research/Pratt's guide to venture capital sources Year: 1992 Vol: 7 (7)Pages: 1679-1684
© 2026 ScienceGate Book Chapters — All rights reserved.