Chemical vapor deposition of tantalum nitride films

Takehiko Takahashi; Hideaki Itoh; Shiroh Ozeki

doi:10.1016/0022-5088(77)90232-6

ScienceGate Book Chapters

JOURNAL ARTICLE

Chemical vapor deposition of tantalum nitride films

Takehiko Takahashi Hideaki Itoh Shiroh Ozeki

Year: 1977 Journal: Journal of the Less Common Metals Vol: 52 (1)Pages: 29-36 Publisher: Elsevier BV

DOI: 10.1016/0022-5088(77)90232-6

Get Full-Text PDF Get Analytical Report

Keywords:

Tantalum nitride Tantalum Materials science Analytical Chemistry (journal) Chemical vapor deposition Nitride Crystallite Substrate (aquarium) Nitrogen Volumetric flow rate X-ray photoelectron spectroscopy Metallurgy Chemistry Chemical engineering Composite material Layer (electronics) Nanotechnology

Metrics

Cited By

0.67

FWCI (Field Weighted Citation Impact)

Refs

0.72

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced ceramic materials synthesis

Physical Sciences → Materials Science → Ceramics and Composites

Chemical vapor deposition of tantalum nitride films

Metrics

Citation History

Topics

Related Documents

Chemical Vapor Deposition of Tantalum Nitride Films Using Pentakis(Diethylamido)Tantalum and Ammonia

Chemical vapor deposition of vanadium, niobium, and tantalum nitride thin films

A new precursor for the chemical vapor deposition of tantalum nitride films

ChemInform Abstract: Chemical Vapor Deposition of Vanadium, Niobium, and Tantalum Nitride Thin Films.

Chemical vapor deposition of aluminum nitride thin films