Electrical properties of glow discharge amorphous SiNx: H thin films

Hideo Watanabe; Kazuhisa Katoh; Masaru Yasui

doi:10.1016/0040-6090(83)90338-3

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Electrical properties of glow discharge amorphous SiNx: H thin films

Hideo Watanabe Kazuhisa Katoh Masaru Yasui

Year: 1983 Journal: Thin Solid Films Vol: 106 (4)Pages: 263-274 Publisher: Elsevier BV

DOI: 10.1016/0040-6090(83)90338-3

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Keywords:

Glow discharge Amorphous solid Photosensitivity Electrical resistivity and conductivity Materials science Doping Thin film Analytical Chemistry (journal) Conductivity Molar ratio Optoelectronics Chemistry Nanotechnology Plasma Physical chemistry Crystallography Organic chemistry Catalysis Electrical engineering

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Electrical properties of glow discharge amorphous SiNx: H thin films

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