JOURNAL ARTICLE

On the field effect in polycrystalline CdSe thin-film transistors

André Van CalsterJan VanfleterenI. De RyckeJohan De Baets

Year: 1988 Journal:   Journal of Applied Physics Vol: 64 (6)Pages: 3282-3286   Publisher: American Institute of Physics

Abstract

Based on the grain barrier model of Levinson an expression of the off-current Ioff of a thin-film transistor is derived.The dependence of Ioff on the donor concentration ND and the semiconductor thickness ds is discussed and compared to experimental data. It is shown that NDds has to be smaller than the grain-boundary trap concentration in order to obtain enhancement thin-film transistors completely turned off at VG=0.

Keywords:
Thin-film transistor Grain boundary Materials science Transistor Thin film Semiconductor Optoelectronics Field-effect transistor Crystallite Condensed matter physics Nanotechnology Electrical engineering Composite material Physics Layer (electronics) Metallurgy

Metrics

26
Cited By
1.33
FWCI (Field Weighted Citation Impact)
10
Refs
0.83
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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