JOURNAL ARTICLE
Scattering mechanism of transparent conducting tin oxide films prepared by magnetron sputtering
I.H. KimJaehyoung KoDaehyun KimK.S. LeeT.S. LeeJeung‐hyun JeongByung‐ki CheongYoung‐Joon BaikW.M. Kim
Year: 2006 Journal: Thin Solid Films Vol: 515 (4)Pages: 2475-2480 Publisher: Elsevier BV
Keywords:
Amorphous solid Materials science Sputter deposition Scattering Thin film Electrical resistivity and conductivity Annealing (glass) Crystallite Ionized impurity scattering Hall effect Sputtering Carrier scattering Grain boundary Tin oxide Analytical Chemistry (journal) Condensed matter physics Doping Optics Optoelectronics Chemistry Microstructure Crystallography Composite material Nanotechnology Metallurgy Physics
Metrics
78
Cited By
1.67
FWCI (Field Weighted Citation Impact)
14
Refs
0.83
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
ZnO doping and properties
Physical Sciences → Materials Science → Materials Chemistry
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Gas Sensing Nanomaterials and Sensors
Physical Sciences → Engineering → Electrical and Electronic Engineering
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