Work function of transparent conducting multicomponent oxide thin films prepared by magnetron sputtering

Tadatsugu Minami; Toshihiro Miyata; Takashi Yamamoto

doi:10.1016/s0257-8972(98)00592-1

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Work function of transparent conducting multicomponent oxide thin films prepared by magnetron sputtering

Tadatsugu Minami Toshihiro Miyata Takashi Yamamoto

Year: 1998 Journal: Surface and Coatings Technology Vol: 108-109 Pages: 583-587 Publisher: Elsevier BV

DOI: 10.1016/s0257-8972(98)00592-1

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Keywords:

Ternary operation Materials science Sputter deposition X-ray photoelectron spectroscopy Oxide Sputtering Ultraviolet photoelectron spectroscopy Cavity magnetron Thin film Work function Optoelectronics Chemical engineering Ultraviolet Analytical Chemistry (journal) Nanotechnology Chemistry Metallurgy Layer (electronics) Organic chemistry Computer science

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Work function of transparent conducting multicomponent oxide thin films prepared by magnetron sputtering

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Citation History

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