Structure of nitride film hard coatings prepared by reactive magnetron sputtering

R. Mănăilă; D. Biró; A. Dévényi; D. Fratiloiu; Radian Popescu; J.E. Totolici

doi:10.1016/s0169-4332(98)00258-x

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Structure of nitride film hard coatings prepared by reactive magnetron sputtering

R. Mănăilă D. Biró A. Dévényi D. Fratiloiu Radian Popescu J.E. Totolici

Year: 1998 Journal: Applied Surface Science Vol: 134 (1-4)Pages: 1-10 Publisher: Elsevier BV

DOI: 10.1016/s0169-4332(98)00258-x

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Keywords:

Tin Materials science Sputtering Microstructure Sputter deposition Nitride Titanium nitride Zirconium nitride Lattice constant Cavity magnetron Substrate (aquarium) Texture (cosmology) Diffraction Thin film Metallurgy Analytical Chemistry (journal) Composite material Layer (electronics) Optics Nanotechnology Chemistry

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Structure of nitride film hard coatings prepared by reactive magnetron sputtering

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