Fe<i>x</i>N thin films with perpendicular magnetic anisotropy

Seiichi Asada; Masahiro Kitada

doi:10.1063/1.95885

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FexN thin films with perpendicular magnetic anisotropy

Seiichi Asada Masahiro Kitada

Year: 1985 Journal: Applied Physics Letters Vol: 46 (8)Pages: 792-793 Publisher: American Institute of Physics

DOI: 10.1063/1.95885

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Abstract

FexN(x=2–3) thin films with perpendicular magnetic anisotropy are prepared by rf sputtering. Although conventional rf sputtered FexN films are magnetized in the direction of the film plane, dc biasing of the substrate during rf sputtering produces magnetic anisotropy normal to the film plane.

Keywords:

Sputtering Magnetic anisotropy Thin film Condensed matter physics Materials science Film plane Anisotropy Perpendicular Substrate (aquarium) Biasing Sputter deposition Nuclear magnetic resonance Magnetization Optics Magnetic field Physics Nanotechnology Voltage

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Magnetic properties of thin films

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

FexN thin films with perpendicular magnetic anisotropy

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