JOURNAL ARTICLE
Perpendicular Magnetic Anisotropy of Amorphous Fe-Nd Alloy Thin Films
Year: 1985 Journal: Japanese Journal of Applied Physics Vol: 24 (3A)Pages: L199-L199 Publisher: Institute of Physics
Abstract
The dependence of perpendicular magnetic anisotropy on concentration and temperature in Fe 100- x Nd x thin films (18 ≤ x ≤60) fabricated by rf sputtering is described. The perpendicular magnetic anisotropy constant K u is maximum (\doteqdot1 ×10 7 erg/cc) for films with x =40 ∼45 made at substrate temperatures in the range from 220°C to 290°C. The presence of the maximum of K u as a function of temperature is also found for x = 35 and 40 at 40 K and 80 K, respectively.
Keywords:
Materials science Amorphous solid Anisotropy Thin film Magnetic anisotropy Sputtering Alloy Condensed matter physics Substrate (aquarium) Perpendicular Atmospheric temperature range Nuclear magnetic resonance Analytical Chemistry (journal) Magnetization Chemistry Crystallography Optics Metallurgy Magnetic field Nanotechnology Physics Thermodynamics
Metrics
22
Cited By
3.66
FWCI (Field Weighted Citation Impact)
8
Refs
0.94
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Topics
Magnetic Properties and Applications
Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials
Metallic Glasses and Amorphous Alloys
Physical Sciences → Engineering → Mechanical Engineering
Magnetic properties of thin films
Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics
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