Characterization of n-ZnO/p-Si films grown by magnetron sputtering

F. Chaabouni; M. Abaab; B. Rezig

doi:10.1016/j.spmi.2005.08.070

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Characterization of n-ZnO/p-Si films grown by magnetron sputtering

F. Chaabouni M. Abaab B. Rezig

Year: 2005 Journal: Superlattices and Microstructures Vol: 39 (1-4)Pages: 171-178 Publisher: Elsevier BV

DOI: 10.1016/j.spmi.2005.08.070

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Keywords:

Materials science Substrate (aquarium) Sputter deposition Heterojunction Optoelectronics Silicon Sputtering Capacitance Cavity magnetron Reflection (computer programming) Thin film Analytical Chemistry (journal) Nanotechnology Electrode Chemistry

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Semiconductor materials and interfaces

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Characterization of n-ZnO/p-Si films grown by magnetron sputtering

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