JOURNAL ARTICLE
Characterization of carbon nitride thin films deposited by microwave plasma chemical vapor deposition
Y.P. ZhangYousong GuXiangpeng ChangZhen TianDong ShiX.F. ZhangLi Yuan
Year: 2000 Journal: Surface and Coatings Technology Vol: 127 (2-3)Pages: 259-264 Publisher: Elsevier BV
Keywords:
X-ray photoelectron spectroscopy Raman spectroscopy Chemical vapor deposition Materials science Analytical Chemistry (journal) Carbon nitride Stoichiometry Thin film Chemical bond Carbon film Fourier transform infrared spectroscopy Nitride Microwave Physical chemistry Nanotechnology Nuclear magnetic resonance Chemical engineering Chemistry Optics Organic chemistry
Metrics
17
Cited By
1.32
FWCI (Field Weighted Citation Impact)
11
Refs
0.80
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Diamond and Carbon-based Materials Research
Physical Sciences → Materials Science → Materials Chemistry
Metal and Thin Film Mechanics
Physical Sciences → Engineering → Mechanics of Materials
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
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