Silicon nitride films deposited by Hg-photosensitization chemical vapor deposition

M. Lemiti; S. Audisio; J.C. Dupuy; B. Balland

doi:10.1016/s0022-3093(05)80409-0

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Silicon nitride films deposited by Hg-photosensitization chemical vapor deposition

M. Lemiti S. Audisio J.C. Dupuy B. Balland

Year: 1992 Journal: Journal of Non-Crystalline Solids Vol: 144 Pages: 261-268 Publisher: Elsevier BV

DOI: 10.1016/s0022-3093(05)80409-0

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Keywords:

Chemical vapor deposition Materials science Silicon nitride Deposition (geology) Ultraviolet Dielectric Infrared Refractive index Analytical Chemistry (journal) Silicon Irradiation Nitride Optoelectronics Chemistry Nanotechnology Optics

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Silicon nitride films deposited by Hg-photosensitization chemical vapor deposition

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