JOURNAL ARTICLE

Direct fabrication of nano-gap electrodes by focused ion beam etching

Takashi NagaseKenji GamoTohru KubotaShinro Mashiko

Year: 2005 Journal:   Thin Solid Films Vol: 499 (1-2)Pages: 279-284   Publisher: Elsevier BV
Keywords:
Fabrication Materials science Electrode Etching (microfabrication) Focused ion beam Nano- Nanotechnology Optoelectronics Sputtering Ion beam Reactive-ion etching Ion Thin film Composite material Chemistry Layer (electronics)

Metrics

58
Cited By
3.22
FWCI (Field Weighted Citation Impact)
15
Refs
0.92
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Molecular Junctions and Nanostructures
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Electrochemical Analysis and Applications
Physical Sciences →  Chemistry →  Electrochemistry
Nanowire Synthesis and Applications
Physical Sciences →  Engineering →  Biomedical Engineering
© 2026 ScienceGate Book Chapters — All rights reserved.