Direct fabrication of nano-gap electrodes by focused ion beam etching

Takashi Nagase; Kenji Gamo; Tohru Kubota; Shinro Mashiko

doi:10.1016/j.tsf.2005.07.031

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Direct fabrication of nano-gap electrodes by focused ion beam etching

Takashi Nagase Kenji Gamo Tohru Kubota Shinro Mashiko

Year: 2005 Journal: Thin Solid Films Vol: 499 (1-2)Pages: 279-284 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2005.07.031

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Keywords:

Fabrication Materials science Electrode Etching (microfabrication) Focused ion beam Nano- Nanotechnology Optoelectronics Sputtering Ion beam Reactive-ion etching Ion Thin film Composite material Chemistry Layer (electronics)

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Molecular Junctions and Nanostructures

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electrochemical Analysis and Applications

Physical Sciences → Chemistry → Electrochemistry

Nanowire Synthesis and Applications

Physical Sciences → Engineering → Biomedical Engineering

Direct fabrication of nano-gap electrodes by focused ion beam etching

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