Nano-photomask fabrication using focused ion beam direct writing

Fengzhou Fang; Zongwei Xu; Xiao Hu; C.T. Wang; X. Luo; Yongqi Fu

doi:10.1016/j.cirp.2010.03.038

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Nano-photomask fabrication using focused ion beam direct writing

Fengzhou Fang Zongwei Xu Xiao Hu C.T. Wang X. Luo Yongqi Fu

Year: 2010 Journal: CIRP Annals Vol: 59 (1)Pages: 543-546 Publisher: Elsevier BV

DOI: 10.1016/j.cirp.2010.03.038

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Keywords:

Photomask Fabrication Materials science Ion beam Optics Focused ion beam Beam (structure) Dwell time Nano- Maskless lithography Optoelectronics Nanotechnology Ion Resist Electron-beam lithography Chemistry Physics

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Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Force Microscopy Techniques and Applications

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Nano-photomask fabrication using focused ion beam direct writing

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