Reactive R.F. magnetron sputtering deposition of WO3 thin films

C. Lemire; D. Lollman; Ahmad Al Mohammad; E. Gillet; Khalifa Aguir

doi:10.1016/s0925-4005(02)00009-6

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Reactive R.F. magnetron sputtering deposition of WO3 thin films

C. Lemire D. Lollman Ahmad Al Mohammad E. Gillet Khalifa Aguir

Year: 2002 Journal: Sensors and Actuators B Chemical Vol: 84 (1)Pages: 43-48 Publisher: Elsevier BV

DOI: 10.1016/s0925-4005(02)00009-6

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Keywords:

Scanning electron microscope Materials science Sputter deposition Transmission electron microscopy Thin film Microstructure Tungsten trioxide Sputtering Analytical Chemistry (journal) Annealing (glass) X-ray photoelectron spectroscopy Chemical engineering Chemical composition Chemical vapor deposition Tungsten Nanotechnology Chemistry Composite material Metallurgy

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Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Analytical Chemistry and Sensors

Physical Sciences → Chemical Engineering → Bioengineering

Reactive R.F. magnetron sputtering deposition of WO3 thin films

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