JOURNAL ARTICLE

Optical absorption of free-standing porous silicon films

M. H. ChanShu Kong SoKok‐Wai Cheah

Year: 1996 Journal:   Journal of Applied Physics Vol: 79 (6)Pages: 3273-3275   Publisher: American Institute of Physics

Abstract

The optical absorptions of anodically etched p+ and n+ porous silicon (PS) films were investigated by photothermal deflection spectroscopy. Si–H stretching overtones and combination bands of Si–F and Si–H were observed. The defect model in hydrogenated amorphous silicon was used to explain the Urbach edge and the subgap absorptions of PS. The dangling bond defect densities in PS were estimated.

Keywords:
Dangling bond Porous silicon Silicon Materials science Amorphous silicon Photothermal spectroscopy Photothermal therapy Absorption (acoustics) Amorphous solid Absorption spectroscopy Amorphous semiconductors Spectroscopy Absorption edge Infrared spectroscopy Analytical Chemistry (journal) Optoelectronics Optics Crystallography Nanotechnology Chemistry Crystalline silicon Band gap Composite material

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46
Cited By
1.61
FWCI (Field Weighted Citation Impact)
19
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0.83
Citation Normalized Percentile
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Citation History

Topics

Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Nanowire Synthesis and Applications
Physical Sciences →  Engineering →  Biomedical Engineering
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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