JOURNAL ARTICLE

Ultrafast absorption in free-standing porous silicon films

Jeffrey C. OwrutskyJane K. RiceS. GuhaPeter SteinerWalter Lang

Year: 1995 Journal:   Applied Physics Letters Vol: 67 (14)Pages: 1966-1968   Publisher: American Institute of Physics

Abstract

Ultrafast absorption studies on free-standing porous silicon films have been carried out at room temperature to investigate the carrier dynamics and the luminescence mechanism. Ultraviolet and visible excitations were used on an as-prepared sample and two annealed samples. Transient absorption curves of UV pumped, as-prepared samples contain a fast decay (τf) of 0.8±0.2 ps and a slower decay of ≳30 ps. τf is found to be shorter for both the 500 °C annealed sample with UV excitation and for the as-prepared sample with visible excitation. The faster decay rates suggest that the subpicosecond component of the transient absorption may be due to carrier thermalization rather than core-to-surface state excitation transfer.

Keywords:
Porous silicon Silicon Excitation Materials science Ultrashort pulse Absorption (acoustics) Ultrafast laser spectroscopy Analytical Chemistry (journal) Luminescence Annealing (glass) Ultraviolet Molecular physics Chemistry Optoelectronics Optics Laser

Metrics

7
Cited By
0.32
FWCI (Field Weighted Citation Impact)
1
Refs
0.51
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Anodic Oxide Films and Nanostructures
Physical Sciences →  Materials Science →  Materials Chemistry

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