JOURNAL ARTICLE
Fully CMOS-compatible top-down fabrication of sub-50nm silicon nanowire sensing devices
Yordan M. GeorgievNikolay PetkovBrendan McCarthyRan YuVladimir DjaraDan O’ConnellOlan LottyAdrian M. NightingaleNuchutha ThamsumetJohn C. de MelloAlan BlakeSamaresh DasJustin D. Holmes
Year: 2014 Journal: Microelectronic Engineering Vol: 118 Pages: 47-53 Publisher: Elsevier BV
Keywords:
Fabrication Silicon nanowires Materials science Nanotechnology Nanowire CMOS Silicon Optoelectronics
Metrics
16
Cited By
0.74
FWCI (Field Weighted Citation Impact)
29
Refs
0.72
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Nanowire Synthesis and Applications
Physical Sciences → Engineering → Biomedical Engineering
Advancements in Semiconductor Devices and Circuit Design
Physical Sciences → Engineering → Electrical and Electronic Engineering
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Related Documents
JOURNAL ARTICLE
Top-Down Fabrication of Fully CMOS-Compatible Silicon Nanowire Arrays and Their Integration into CMOS Inverters on Plastic
Myeongwon LeeYoungin JeonTaeho MoonSangsig Kim
Journal: ACS Nano Year: 2011 Vol: 5 (4)Pages: 2629-2636
JOURNAL ARTICLE
Top-Down Fabrication of Fully CMOS-Compatible Silicon Nanowire Arrays and Their Integration into CMOS Inverters on Plastic
Myeongwon Lee (2205943)Youngin Jeon (1410493)Taeho Moon (2154055)Sangsig Kim (1410496)
Journal: OPAL (Open@LaTrobe) (La Trobe University) Year: 2016
JOURNAL ARTICLE
Fabrication of Sub-100-nm silicon nanowire devices on SOI wafer by CMOS compatible fabrication process
Liangliang SunT M H LeeZhenchuan YangG.Z. Yan
Year: 2010 Vol: 23 Pages: 971-974
JOURNAL ARTICLE
Fabrication of Silicon Nanowire Field-Effect Transistor Biosensor by CMOS Compatible Top-Down Approach with Descum Process
Young‐Soo SohnGil Bum KangYong Tae Kim
Journal: Sensor Letters Year: 2009 Vol: 7 (6)Pages: 1039-1043