In-line deposition of silicon-based films by hot-wire chemical vapor deposition

Lothar Schäfer; Tino Harig; Markus J. Hofer; Artur Laukart; Dietmar Borchert; S. Keipert‐Colberg; J. Trube

doi:10.1016/j.surfcoat.2012.08.085

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In-line deposition of silicon-based films by hot-wire chemical vapor deposition

Lothar Schäfer Tino Harig Markus J. Hofer Artur Laukart Dietmar Borchert S. Keipert‐Colberg J. Trube

Year: 2012 Journal: Surface and Coatings Technology Vol: 215 Pages: 141-147 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2012.08.085

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Keywords:

Materials science Chemical vapor deposition Nanocrystalline silicon Silicon Thin film Amorphous silicon Passivation Silane Deposition (geology) Silicon nitride Carbon film Crystalline silicon Solar cell Substrate (aquarium) Plasma-enhanced chemical vapor deposition Optoelectronics Nanotechnology Composite material Layer (electronics)

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Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

In-line deposition of silicon-based films by hot-wire chemical vapor deposition

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