Ultrafast deposition of silicon nitride and semiconductor silicon thin films by hot wire chemical vapor deposition

R.E.I. Schropp; C.H.M. van der Werf; V. Verlaan; J.K. Rath; H. Li

doi:10.1016/j.tsf.2008.11.101

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Ultrafast deposition of silicon nitride and semiconductor silicon thin films by hot wire chemical vapor deposition

R.E.I. Schropp C.H.M. van der Werf V. Verlaan J.K. Rath H. Li

Year: 2008 Journal: Thin Solid Films Vol: 517 (10)Pages: 3039-3042 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2008.11.101

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Keywords:

Chemical vapor deposition Materials science Silicon nitride Silicon Thin film Optoelectronics Wafer Deposition (geology) Combustion chemical vapor deposition Nanotechnology Plasma-enhanced chemical vapor deposition Solar cell Nanocrystalline material Carbon film

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Topics

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Ultrafast deposition of silicon nitride and semiconductor silicon thin films by hot wire chemical vapor deposition

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