Nanostructured films of iron, tin and titanium oxides by chemical vapor deposition

Sanjay Mathur; Владимир Сиваков; Hao Shen; Sven Barth; Christian Cavelius; Anders Nilsson; Patrick Kühn

doi:10.1016/j.tsf.2005.07.249

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Nanostructured films of iron, tin and titanium oxides by chemical vapor deposition

Sanjay Mathur Владимир Сиваков Hao Shen Sven Barth Christian Cavelius Anders Nilsson Patrick Kühn

Year: 2005 Journal: Thin Solid Films Vol: 502 (1-2)Pages: 88-93 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2005.07.249

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Keywords:

Tin Materials science Chemical vapor deposition Titanium Microstructure Chemical engineering Nanometre Deposition (geology) Phase (matter) Thin film Decomposition Photocatalysis Quartz Metallurgy Mineralogy Nanotechnology Composite material Chemistry Catalysis

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Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Analytical Chemistry and Sensors

Physical Sciences → Chemical Engineering → Bioengineering

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Nanostructured films of iron, tin and titanium oxides by chemical vapor deposition

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