JOURNAL ARTICLE

Nanotribological Behavior of Ultra-thin Al2O3 Films Prepared by Atomic Layer Deposition

Zhimin ChaiYuhong LiuXinchun LuDannong He

Year: 2014 Journal:   Tribology Letters Vol: 55 (1)Pages: 143-149   Publisher: Springer Science+Business Media
Keywords:
Materials science Nanoelectromechanical systems Tribology Atomic layer deposition Layer (electronics) Thin film Substrate (aquarium) Rubbing Microelectromechanical systems Nanotechnology Nanotribology X-ray photoelectron spectroscopy Adhesion Scratch Deposition (geology) Composite material Coating Chemical engineering Nanoparticle

Metrics

11
Cited By
2.36
FWCI (Field Weighted Citation Impact)
36
Refs
0.88
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Diamond and Carbon-based Materials Research
Physical Sciences →  Materials Science →  Materials Chemistry
Force Microscopy Techniques and Applications
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics

Related Documents

JOURNAL ARTICLE

Characterization of Al2O3/GaAs interfaces and thin films prepared by atomic layer deposition

Ram Ekwal SahChristoph TegenkampM. BaeumlerFrank BernhardtR. DriadM. MikullaO. Ambacher

Journal:   Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena Year: 2013 Vol: 31 (4)
JOURNAL ARTICLE

Thermal Stability of Atomic Layer Deposition Al2O3 Thin Films

Lu Hong-LiangMin XuDing Shi-JinJie RenWei Zhang

Journal:   Journal of Inorganic Materials Year: 2006 Vol: 21 (5)
© 2026 ScienceGate Book Chapters — All rights reserved.