Nanotribological Behavior of Ultra-thin Al2O3 Films Prepared by Atomic Layer Deposition

Zhimin Chai; Yuhong Liu; Xinchun Lu; Dannong He

doi:10.1007/s11249-014-0341-0

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Nanotribological Behavior of Ultra-thin Al2O3 Films Prepared by Atomic Layer Deposition

Zhimin Chai Yuhong Liu Xinchun Lu Dannong He

Year: 2014 Journal: Tribology Letters Vol: 55 (1)Pages: 143-149 Publisher: Springer Science+Business Media

DOI: 10.1007/s11249-014-0341-0

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Keywords:

Materials science Nanoelectromechanical systems Tribology Atomic layer deposition Layer (electronics) Thin film Substrate (aquarium) Rubbing Microelectromechanical systems Nanotechnology Nanotribology X-ray photoelectron spectroscopy Adhesion Scratch Deposition (geology) Composite material Coating Chemical engineering Nanoparticle

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Force Microscopy Techniques and Applications

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Nanotribological Behavior of Ultra-thin Al2O3 Films Prepared by Atomic Layer Deposition

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