JOURNAL ARTICLE

<title>Pattern Recognition Automatic Fine Alignment</title>

Donald H. Berry

Year: 1982 Journal:   Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Vol: 0334 Pages: 10-16   Publisher: SPIE

Abstract

As alignment tolerances and the associated overlay characteristics become more important to microlithography, automatic alignment has proven to be necessary for high yields and consistent throughput. This paper describes an Automatic Alignment System designed for, but not limited to, projection printers. In this scheme a vidicon is used to detect the images projected from special targets on the mask and wafer. The video information is procesed by a microcomputer system that performs a pattern recognition algorithm to determine target position and the necessary alignment correction. The system closely resembles operator alignment in concept, yet gives greater accuracy and more consistent performance. Operational principles and actual performance are discussed.

Keywords:
Computer science Microcomputer Overlay Computer vision Artificial intelligence Projection (relational algebra) Throughput Position (finance) Wafer Pattern recognition (psychology) Computer hardware Algorithm Engineering Telecommunications

Metrics

1
Cited By
0.46
FWCI (Field Weighted Citation Impact)
0
Refs
0.70
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Industrial Vision Systems and Defect Detection
Physical Sciences →  Engineering →  Industrial and Manufacturing Engineering
Advanced Surface Polishing Techniques
Physical Sciences →  Engineering →  Biomedical Engineering

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