Properties of transparent conductive ZnO:Al thin films prepared by magnetron sputtering

Engang Fu; Da-Ming Zhuang; Gong Zhang; Ming Zhao; Wei-Fang Yang; Jia-Jun Liu

doi:10.1016/s0026-2692(03)00251-9

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Properties of transparent conductive ZnO:Al thin films prepared by magnetron sputtering

Engang Fu Da-Ming Zhuang Gong Zhang Ming Zhao Wei-Fang Yang Jia-Jun Liu

Year: 2003 Journal: Microelectronics Journal Vol: 35 (4)Pages: 383-387 Publisher: Elsevier BV

DOI: 10.1016/s0026-2692(03)00251-9

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Keywords:

Materials science Diffractometer Transmittance Sheet resistance Sputter deposition Wafer Thin film Optoelectronics Electrical resistivity and conductivity Cavity magnetron Scanning electron microscope Ceramic Sputtering Electrical conductor Visible spectrum Transparent conducting film Composite material Optics Layer (electronics) Nanotechnology Electrical engineering

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Properties of transparent conductive ZnO:Al thin films prepared by magnetron sputtering

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