Mechanisms of suboxide growth and etching in atomic layer deposition of tantalum oxide from TaCl5 and H2O

Jaan Aarik; Kaupo Kukli; Aleks Aidla; L. Pung

doi:10.1016/s0169-4332(96)00554-5

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JOURNAL ARTICLE

Mechanisms of suboxide growth and etching in atomic layer deposition of tantalum oxide from TaCl5 and H2O

Jaan Aarik Kaupo Kukli Aleks Aidla L. Pung

Year: 1996 Journal: Applied Surface Science Vol: 103 (4)Pages: 331-341 Publisher: Elsevier BV

DOI: 10.1016/s0169-4332(96)00554-5

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Keywords:

Suboxide Tantalum Atomic layer deposition Etching (microfabrication) Layer (electronics) Analytical Chemistry (journal) Oxide Deposition (geology) Materials science Thin film Tantalum nitride Chemistry Nanotechnology Metallurgy

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Topics

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Acoustic Wave Resonator Technologies

Physical Sciences → Engineering → Biomedical Engineering

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

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