Deposition and etching of tantalum oxide films in atomic layer epitaxy process

Jaan Aarik; Aleks Aidla; Kaupo Kukli; Teet Uustare

doi:10.1016/0022-0248(94)90019-1

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Deposition and etching of tantalum oxide films in atomic layer epitaxy process

Jaan Aarik Aleks Aidla Kaupo Kukli Teet Uustare

Year: 1994 Journal: Journal of Crystal Growth Vol: 144 (1-2)Pages: 116-119 Publisher: Elsevier BV

DOI: 10.1016/0022-0248(94)90019-1

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Keywords:

Tantalum Etching (microfabrication) Epitaxy Atomic layer epitaxy Layer (electronics) Atomic layer deposition Oxide Deposition (geology) Growth rate Materials science Analytical Chemistry (journal) Chemistry Chemical engineering Inorganic chemistry Mineralogy Nanotechnology Metallurgy Environmental chemistry

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Catalytic Processes in Materials Science

Physical Sciences → Materials Science → Materials Chemistry

Deposition and etching of tantalum oxide films in atomic layer epitaxy process

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