Properties of tantalum oxide thin films grown by atomic layer deposition

Kaupo Kukli; Jaan Aarik; Aleks Aidla; Oksana Kohan; Teet Uustare; Väino Sammelselg

doi:10.1016/0040-6090(94)06388-5

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Properties of tantalum oxide thin films grown by atomic layer deposition

Kaupo Kukli Jaan Aarik Aleks Aidla Oksana Kohan Teet Uustare Väino Sammelselg

Year: 1995 Journal: Thin Solid Films Vol: 260 (2)Pages: 135-142 Publisher: Elsevier BV

DOI: 10.1016/0040-6090(94)06388-5

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Keywords:

Tantalum Amorphous solid Crystallite Analytical Chemistry (journal) Thin film Materials science Atomic layer deposition Band gap Refractive index Layer (electronics) Deposition (geology) Oxide Absorption (acoustics) Chemistry Nanotechnology Crystallography Metallurgy Optoelectronics Composite material

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Properties of tantalum oxide thin films grown by atomic layer deposition

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