Diamond chemical vapour deposition using tantalum filaments in H2CH4O2 gas mixtures

Jan Brückner; T. Mäntylä

doi:10.1016/0925-9635(93)90085-g

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Diamond chemical vapour deposition using tantalum filaments in H2CH4O2 gas mixtures

Jan Brückner T. Mäntylä

Year: 1993 Journal: Diamond and Related Materials Vol: 2 (2-4)Pages: 373-377 Publisher: Elsevier BV

DOI: 10.1016/0925-9635(93)90085-g

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Keywords:

Chemical vapor deposition Methane Oxygen Diamond Protein filament Silicon Tantalum Raman spectroscopy Analytical Chemistry (journal) Materials science Deposition (geology) Chemistry Chemical engineering Nanotechnology Metallurgy Composite material Environmental chemistry Optics Organic chemistry

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond chemical vapour deposition using tantalum filaments in H2CH4O2 gas mixtures

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