JOURNAL ARTICLE

Chemical vapour deposition of tantalum diboride

Seiji MotojimaKohzo Sugiyama

Year: 1979 Journal:   Journal of Materials Science Vol: 14 (12)Pages: 2859-2864   Publisher: Springer Science+Business Media
Keywords:
Tantalum Materials science Impurity Chemical vapor deposition Substrate (aquarium) Analytical Chemistry (journal) Indentation hardness Titanium diboride Chemical composition Boron Metallurgy Nanotechnology Microstructure Chemistry

Metrics

12
Cited By
1.39
FWCI (Field Weighted Citation Impact)
9
Refs
0.78
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Advanced ceramic materials synthesis
Physical Sciences →  Materials Science →  Ceramics and Composites
Copper Interconnects and Reliability
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials

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