Chemical vapour deposition and characterization of smooth {100}-faceted diamond films

C. Wild; P. Koidl; W. Müller-Sebert; H. Walcher; R. Kohl; N. Herres; R. Locher; R. Samlenski; R. Brenn

doi:10.1016/0925-9635(93)90047-6

ScienceGate Book Chapters

JOURNAL ARTICLE

Chemical vapour deposition and characterization of smooth {100}-faceted diamond films

C. Wild P. Koidl W. Müller-Sebert H. Walcher R. Kohl N. Herres R. Locher R. Samlenski R. Brenn

Year: 1993 Journal: Diamond and Related Materials Vol: 2 (2-4)Pages: 158-168 Publisher: Elsevier BV

DOI: 10.1016/0925-9635(93)90047-6

Get Full-Text PDF Get Analytical Report

Keywords:

Texture (cosmology) Materials science Specular reflection Diamond Chemical vapor deposition Crystallite Surface finish Optics Substrate (aquarium) Scattering Dielectric Surface roughness Crystallography Composite material Chemistry Nanotechnology Optoelectronics

Metrics

335

Cited By

24.35

FWCI (Field Weighted Citation Impact)

Refs

1.00

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Chemical vapour deposition and characterization of smooth {100}-faceted diamond films

Metrics

Citation History

Topics

Related Documents

Development of flat, smooth (100) faceted diamond thin films using microwave plasma chemical vapor deposition

Synthesis and structural characterization of highly 〈100〉-oriented {100}-faceted nanocrystalline diamond films by microwave plasma chemical vapor deposition

DIAMOND CHEMICAL VAPOUR DEPOSITION

DIAMOND CHEMICAL VAPOUR DEPOSITION

Si-doped diamond films prepared by chemical vapour deposition