JOURNAL ARTICLE

High power 1.017-μm strained-layer quantum well lasers grown by metalorganic chemical-vapor deposition

M. OhkuboTetsuro IjichiAkira IketaniToshio Kikuta

Year: 1992 Journal:   Applied Physics Letters Vol: 60 (12)Pages: 1413-1414   Publisher: American Institute of Physics

Abstract

We have fabricated InGaAs/GaAs/InGaP strained-layer single quantum well (SLSQW) lasers emitting at 1.017 μm, which are suitable pumping sources for Pr3+-doped fluoride 1.3-μm fiber amplifiers, grown by metalorganic chemical-vapor deposition (MOCVD). A very low threshold current density of 80 A/cm2 was obtained for the broad-area lasers. This value is comparable to that of 0.98-μm SLSQW lasers. Continuous wave light output power of over 100 mW was achieved on the 2-μm-wide ridge waveguide lasers.

Keywords:
Chemical vapor deposition Metalorganic vapour phase epitaxy Optoelectronics Laser Materials science Quantum well Layer (electronics) Semiconductor laser theory Gallium arsenide Optics Semiconductor Epitaxy Nanotechnology Physics

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Topics

Semiconductor Lasers and Optical Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Photonic Crystal and Fiber Optics
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Solid State Laser Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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